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  6. 奈米IC晶片製程:縮線寬
2025年中文版

奈米IC晶片製程:縮線寬

Author Kung Linliu
Publisher Kung Linliu
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Released
2025/02/05
Language
Traditional Chinese
File format
PDF (1MB), fit in large screen and Pubook
Pages
25
ID
489360
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半導體線寬製程控制: 以高密度電漿乾蝕刻底部抗反射塗佈層控制線寬的方法!可以縮小線寬1/4甚至達1/10，這也就是使用193奈米曝光機，作7奈米的重要方法之一!
實施多次上述的方法，可以提高多倍的解析度!但是良率(yield rate)也會降低很多!
這就是使用193奈米曝光機，作7奈米不如EUV的結果!

Details

Released
2025/02/05
Language
Traditional Chinese
File format
PDF: Fit in large screen
Provide Adobe DRM
Provide PDF
Offer DRM free license
Yes
ID
489360

Buy products firstAnd download app to watch

Details
　　

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